1.

Conference Proceedings
Conference Proceedings
1. Reticle quality needs for advanced 193-nm lithography
Jonckheere,R.M. ; Vandenberghe,G.N. ; Wiaux,V. ; Verhaegen,S. ; Ronse,K.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VIII.  pp.108-117,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4409
2.

Conference Proceedings
Conference Proceedings
2. (Sub-) 100-nm gate patterning using 248-nm alternating PSM
Vandenberghe,G.N. ; Jaenen,P. ; Jonckheere,R.M. ; Ronse,K. ; Toublan,O.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VIII.  pp.61-69,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4409