1.
Conference Proceedings
Park, D.-I. ; Park, E.-S. ; Lee, J.-H. ; Jeong, W.-G. ; Seo, S.-K. ; Kwon, H.-J. ; Kim, J.-M. ; Jung, S.-M. ; Choi, S.-S.
Pub. info.:
Photomask and Next-Generation Lithography Mask Technology X . pp.78-85, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5130
2.
Conference Proceedings
Jeong, W.-G. ; Lee, J.-K. ; Park, D.I. ; Park, E.-S. ; Lee, J.-H. ; Seo, S.-K. ; Lee, D.-H. ; Kim, J.-M. ; Choi, S.S. ; Jeong, S.H.
Pub. info.:
22nd Annual BACUS Symposium on Photomask Technology . Part One pp.626-633, 2002. Bellingham, WA. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4889
3.
Conference Proceedings
Park, D.-I. ; Seo, S.-K. ; Park, E.-S. ; Lee, J.-H. ; Jeong, W.-G. ; Kim, J.-M. ; Choi, S.-S. ; Jeong, S.-H.
Pub. info.:
22nd Annual BACUS Symposium on Photomask Technology . Part One pp.634-640, 2002. Bellingham, WA. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4889
4.
Conference Proceedings
Park, D.-I. ; Seo, S.-K. ; Jeong, W.-G. ; Park, E.-S. ; Lee, J.-H. ; Kwon, H.-J. ; Kim, J.-M. ; Jung, S.-M. ; Choi, S.-S.
Pub. info.:
Photomask and Next-Generation Lithography Mask Technology X . pp.190-196, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5130