1.

Conference Proceedings
Conference Proceedings
1. A comprehensive look at a new metrology technique to support the needs of lithography performance in near future
J. Hu ; C.-M. Ke ; W. Wang ; J. Huang ; H. L. Chung
Pub. info.: Lithography Asia 2008.  1  pp.71400N-1-71400N-6,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 7140
2.

Conference Proceedings
Conference Proceedings
2. Sub-nanometer pitch calibration and data quality evaluation methodology
C.-M. Ke ; Y. Wang ; J. Huang ; J. Hu
Pub. info.: Metrology, inspection, and process control for microlithography XXII.  1  pp.69220I-1-69220I-6,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6922