1.

Conference Proceedings
Conference Proceedings
1. Photoresist adhesion effect of resist reflow process
J. Park ; J. Lee ; M. Kim ; J. Kim ; S. Lee ; J. Park ; C. Bok ; S. Moon ; S. Park ; J. Hong ; H. Oh
Pub. info.: Advances in resist materials and processing technology XXIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6519
2.

Conference Proceedings
Conference Proceedings
2. Novel 1x3 wavelength MUX/DeMUX using extraneous self-imaging phenomenon
J. Hong ; J. Jung ; J. Park ; S. Lee
Pub. info.: Optoelectronic integrated circuits IX : 22-24 January 2007, San Jose, California.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6476
3.

Conference Proceedings
Conference Proceedings
3. Analysis of extraneous self-images with weak-guiding multimode interference structure for wavelength MUX
J. Hong ; J. Jung ; J. Kim ; S. Lee
Pub. info.: Optoelectronic integrated circuits IX : 22-24 January 2007, San Jose, California.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6476