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Conference Proceedings

1. Advanced process control with design-based metrology

H. Yang ; J. Kim ; J. Hong ; D. Yim ; T. Hasebe ; M. Yamamoto

Pub. info.:	Metrology, inspection, and process control for microlithography XXI. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6518

Conference Proceedings

2. Photoresist adhesion effect of resist reflow process

J. Park ; J. Lee ; M. Kim ; J. Kim ; S. Lee ; J. Park ; C. Bok ; S. Moon ; S. Park ; J. Hong ; H. Oh

Pub. info.:	Advances in resist materials and processing technology XXIV. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6519

Conference Proceedings

3. Characteristics analysis of polarization module on optical proximity effect

C. Park ; J. Hong ; K. Yang ; T. Theeuwes ; F. Gautier ; Y. Min ; A. Chen ; H. Yang ; D. Yim ; J. Kim

Pub. info.:	Optical microlithography XX. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6520

Conference Proceedings

4. Analysis of extraneous self-images with weak-guiding multimode interference structure for wavelength MUX

J. Hong ; J. Jung ; J. Kim ; S. Lee

Pub. info.:	Optoelectronic integrated circuits IX : 22-24 January 2007, San Jose, California. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6476