1.

Conference Proceedings
Conference Proceedings
1. Proximity effect correction for reticle fabrication
Kamikubo,T. ; Abe,T. ; Oogi,S. ; Anze,H. ; Shimizu,M. ; Itoh,M. ; Nakasugi.T. ; Iijima,T. ; Hattori,Y.
Pub. info.: Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan.  pp.173-177,  1997.  Bellingham, Washington.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3096
2.

Conference Proceedings
Conference Proceedings
2. Process optimization for mask fabrication
Sakurai,H. ; Itoh,M. ; Kumagae,A. ; Anze,H. ; Abe,T. ; Higashikawa,I.
Pub. info.: Photomask and X-Ray Mask Technology V.  pp.183-189,  1998.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3412