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Laser-generated and other laboratory X-ray and EUV sources, optics, and applications : 4-6 August 2003, San Diego, California, USA. pp.156-162, 2004. Bellingham, Wash., USA. SPIE - The International Society of Optical Engineering
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Commercial and biomedical applications of ultrafast lasers VI : 22-25 January 2006, San Jose, California, USA. pp.610810-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
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Corrosion and corrosion control in saltwater environments : proceedings of the international symposium. pp.127-136, 1999. Pennington, NJ. Electrochemical Society
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Low-dielectric constant materials IV : symposium held April 14-16, 1998, San Francisco, California, U.S.A.. pp.341-, 1998. Warrendale, Pa.. MRS - Materials Research Society
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Transducing materials and devices : 30 October-1 November 2002, Brugge, Belgium. pp.98-110, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
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Zeolites and mesoporous materials at the dawn of the 21st century : proceedings of the 13th International Zeolite Conference, Montpellier, France, 8-13 July 2001. pp.321-321, 2001. Amsterdam. Elsevier
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Science and technology in catalysis 2002 : proceedings of the Fourth Tokyo Conference on Advanced Catalytic Science and Technology, Tokyo, July 14-19, 2002. pp.307-310, 2003. Amsterdam. Elsevier
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Recent advances in the science and technology of zeolites and related materials : proceedings of the 14th International Zeolite Conference, Cape Town, South Africa, 25-30th April 2004. pp.2514-2521, 2004. Amsterdam. Elsevier
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Solid-State Chemistry of Inorganic Materials IV : symposium held December 2-6, 2002, Boston, Massachusetts, U.S.A.. pp.303-308, 2003. Warrendale, Pa.. Materials Research Society
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Group-IV semiconductor nanostructures : symposium held November 29-December 2, 2004, Boston, Massachusetts, U.S.A.. pp.269-274, 2005. Warrendale, Pa.. Materials Research Society
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XV International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers. pp.627-630, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
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Sakurai, H. ; Itoh, M. ; Fujiwara, N. ; Yasuda, S. ; Ishimura, T. ; Wakayama, S. ; Ito, S.
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Photomask and Next-Generation Lithography Mask Technology IX. pp.274-281, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering