1.

Conference Proceedings
Conference Proceedings
1. Lithography simulation system for total CD control from design to manufacturing
Kotani, T. ; Ichikawa, H. ; Kobayashi, S. ; Nojima, S. ; Izuha, K. ; Tanaka, S. ; Inoue, S.
Pub. info.: Design and process integration for microelectronic manufacturing III : 3-4 March 2005, San Jose, California, USA.  pp.219-229,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5756
2.

Conference Proceedings
Conference Proceedings
2. Efficient hybrid optical proximity correction method based on the flow of design for manufacturability (DfM)
Kotani, T. ; Ichikawa, H. ; Urakami, T. ; Nojima, S. ; Kobayashi, S. ; Oikawa, Y. ; Tanaka, S. ; Ikeuchi, A. ; Suzuki, K. ; Inoue, S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.628-637,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
3.

Conference Proceedings
Conference Proceedings
3. Advanced hybrid optical proximity correction system with OPC segment library and model-based correction module
Kotani, T. ; Kobayashi, S. ; Ichikawa, H. ; Tanaka, S. ; Watanabe, S. ; Inoue, S.
Pub. info.: Optical Microlithography XV.  Part One  pp.188-195,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691