Search records | 東京工業大学附属図書館文献データベース

Sort order

4 results

Conference Proceedings

1. Strain Degradation in Strained-Si Layers Far Thicker than the Critical Thickness Grown on Relaxed Si_0.65Ge_0.35 Layers

S. Kang ; H. Yuk ; I. Kim ; J. Lee ; S. Lee

Pub. info.:	SiGe and Ge, materials, processing, and devices. pp.411-420, 2006. Pennington, N.J.. Electrochemical Society
Title of ser.:	ECS transactions
Ser. no.:	3(7)

Conference Proceedings

2. OPC in memory-device patterns using boundary layer model for 3-dimensional mask topographic effect

Y. Kim ; I. Kim ; J. Park ; S. Kim ; S. Suh ; Y. Cheon ; S. Lee ; J. Lee ; C. Kang ; J. Moon ; J. Cobb ; S. Lee

Pub. info.:	Optical microlithography XX. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6520

Conference Proceedings

3. Stray-light implementation in optical proximity correction (OPC)

Y. -C. Kim ; D. Kim ; I. Kim ; S. Kim ; S. Suh ; Y. -J. Chun ; S. Lee ; J. Lee ; C. -J. Kang ; J. Moon ; K. Taravade ; S. Lee

Pub. info.:	Photomask and next-generation lithography mask technology XIV. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6607

Conference Proceedings

4. Methodology of flare modeling and compensation in EUVL

I. Kim ; H. Kong ; C. Park ; J.-O. Park ; J. Lee

Pub. info.:	Lithography Asia 2008. 1 pp.714009-1-714009-12, 2008. Bellingham, Wash.. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	7140