1.

Conference Proceedings
Conference Proceedings
1. Substrate effects of silicon nitride on i-line and deep-UV lithography
Kim,B.-C. ; Huh,H. ; Kim,J.J.
Pub. info.: Advances in resist technology and processing XIII : 11-13 March 1996, San Clara, California.  pp.119-130,  1996.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2724
2.

Conference Proceedings
Conference Proceedings
2. Analysis of resist pattern collapse and optimization of DUV process for patterning sub-0.20-ｦﾌm gate line
Yu,J.Y. ; Jeong,G.-M. ; Huh,H. ; Kim,J.J. ; Kim,S.-P. ; Jeong,J.-K. ; Kim,H.-S.
Pub. info.: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 2  pp.880-889,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3333
3.

Conference Proceedings
Conference Proceedings
3. Novel design of WIS-free overlay measurement mark
Yang,J.S. ; Lee,S.B. ; Oh,S.C. ; Huh,H. ; Han,S.B.
Pub. info.: Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California.  pp.764-772,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3998
4.

Conference Proceedings
Conference Proceedings
4. Optimizing of thin-film interference effects in KrF lithography for 0.15-ｦﾌm design rules
Oh,S.-C. ; Kim,Y.-C. ; Nah,S.-H. ; Huh,H. ; Han,S.-B.
Pub. info.: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part2  pp.926-934,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3999
5.

Conference Proceedings
Conference Proceedings
5. Process issues of sub-0.20-ｦﾌm contact hole patterns for logic devices and DRAM
Yang,H. ; Yoon,J. ; Jeong,G. ; Huh,H. ; Kim,J.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part2  pp.726-735,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
6.

Conference Proceedings
Conference Proceedings
6. Low k1 process optimization for i-line lithography
Kim,J.W. ; Huh,H. ; Han,S.B.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part2  pp.1134-1139,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000