1.

Conference Proceedings
Conference Proceedings
1. Substrate effects of silicon nitride on i-line and deep-UV lithography
Kim,B.-C. ; Huh,H. ; Kim,J.J.
Pub. info.: Advances in resist technology and processing XIII : 11-13 March 1996, San Clara, California.  pp.119-130,  1996.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2724
2.

Conference Proceedings
Conference Proceedings
2. Analysis of resist pattern collapse and optimization of DUV process for patterning sub-0.20-ｦﾌm gate line
Yu,J.Y. ; Jeong,G.-M. ; Huh,H. ; Kim,J.J. ; Kim,S.-P. ; Jeong,J.-K. ; Kim,H.-S.
Pub. info.: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 2  pp.880-889,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3333