1.

Conference Proceedings
Conference Proceedings
1. Novel design of WIS-free overlay measurement mark
Yang,J.S. ; Lee,S.B. ; Oh,S.C. ; Huh,H. ; Han,S.B.
Pub. info.: Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California.  pp.764-772,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3998
2.

Conference Proceedings
Conference Proceedings
2. Low k1 process optimization for i-line lithography
Kim,J.W. ; Huh,H. ; Han,S.B.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part2  pp.1134-1139,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000