1.

Conference Proceedings
Conference Proceedings
1. High-performance e-beam resist coupling excellent dry etch resistance and sub-100-nm resolution for advanced mask and device making
Huang,W.-S. ; Kwong,R.W. ; Moreau,W.M. ; Lang,R. ; Robinson,C.F. ; Medeiros,D.R. ; Petrillo,K.E. ; Aviram,A. ; Mahorowala,A.P. ; Angelopoulos,M. ; Magg,C. ; Lawliss,M. ; Faure,T.B.
Pub. info.: Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA.  pp.268-277,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4343
2.

Conference Proceedings
Conference Proceedings
2. Use of KRS-XE positive chemically amplified resist for optical mask manufacturing
Ashe,B. ; Deverich,C. ; Rabidoux,P.A. ; Peck,B. ; Petrillo,K.E. ; Angelopoulos,M. ; Huang,W.-S. ; Moreau,W.M. ; Medeiros,D.R.
Pub. info.: 21st Annual BACUS Symposium on Photomask Technology.  4562  pp.664-672,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4562
3.

Conference Proceedings
Conference Proceedings
3. High-resolution patterning in chemically amplified resists: the effect of film thickness
Medeiros,D.R. ; Moreau,W.M. ; Petrillo,K.E. ; Chauhan,M. ; Huang,W.-S. ; Magg,C. ; Goldfarb,D. ; Angelopoulos,M. ; Nealey,P.F.
Pub. info.: Advances in Resist Technology and Processing XVIII.  4345  pp.241-250,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4345
4.

Conference Proceedings
Conference Proceedings
4. Extending the performance of KRS-XE for high-throughput electron-beam lithography for advanced mask making
Medeiros,D.R. ; Petrillo,K.E. ; Bucchignano,J. ; Angelopoulos,M. ; Huang,W.-S. ; Li,W. ; Moreau,W.M. ; Lang,R. ; Kwong,R.W. ; Magg,C. ; Ashe,B.
Pub. info.: 21st Annual BACUS Symposium on Photomask Technology.  4562  pp.552-560,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4562
5.

Conference Proceedings
Conference Proceedings
5. High-performance e-beam resist coupling excellent dry etch resistance and sub-100-nm resolution for advanced mask making
Huang,W.-S. ; Kwong,R.W. ; Moreau,W.M. ; Lang,R. ; Robinson,C.F. ; Medeiros,D.R. ; Petrillo,K.E. ; Aviram,A. ; Mahorowala,A.P. ; Angelopoulos,M. ; Magg,C. ; Lawliss,M. ; Faure,T.B.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VIII.  pp.287-297,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4409
6.

Conference Proceedings
Conference Proceedings
6. High-contrast positive resists for e-beam mask making
Huang,W.-S. ; Kwong,R.W. ; Moreau,W.M. ; Angelopoulos,M. ; Bucchiagnano,J. ; Petrillo,K.E. ; Ito,H.
Pub. info.: 18th Annual BACUS Symposium on Photomask Technology and Management.  pp.400-408,  1998.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3546