1.

Conference Proceedings
Conference Proceedings
1. Global CD uniformity improvement using dose modulation and pattern correction of pattern density-dependent and position-dependent errors
Chen, C.-J. ; Lee, H.-C. ; Yeh, L.-C. ; Liu, K.-C. ; Lien, T.-C. ; Chuo, Y.-C. ; Hsieh, H.-C. ; Lin, B.J.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.28-37,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
2.

Conference Proceedings
Conference Proceedings
2. Global CD uniformity improvement for CAR masks by adaptive post-exposure bake with CD measurement feedback
Berger, L. ; Saule, W. ; Dress, P. ; Gairing, T.M. ; Chen, C.-J. ; Lee, H.-C. ; Hsieh, H.-C.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.148-154,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
3.

Conference Proceedings
Conference Proceedings
3. Automated CD-error compensation for negative-tone chemically amplified resists by zone-controlled post-exposure bake
Berger, L. ; Dress, P. ; Gairing, T. ; Chen, J.J. ; Hsieh, R.-G. ; Lee, H.-C. ; Hsieh, H.-C.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.380-391,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256
4.

Conference Proceedings
Conference Proceedings
4. Mask-making study for the 65-nm node
Chen, C.-J. ; Lee, H.-C. ; Lu, C.-L. ; Hsieh, R.-G. ; Chen, W.-C. ; Hsieh, H.-C. ; Lin, B.-J.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.673-683,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256
5.

Conference Proceedings
Conference Proceedings
5. Global CD uniformity improvement in mask manufacturing for advanced lithography
Chang, S.-M. ; Chin, C.C. ; Wang, W.-C. ; Lu, C.-L. ; Hsieh, R.-G. ; Tsay, C.-S. ; Yen, Y.-S. ; Chin, S.-C. ; Lee, H.-C. ; Liu, R.-G. ; Chen, K.-S. ; Hsieh, H.-C. ; Ku, Y.C. ; Lin, J.C.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.1065-1071,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256