1.

Conference Proceedings
Conference Proceedings
1. Interfield sampling method dependency of overlay and global alignment
Hong,J. ; Lee,J. ; Cho,H. ; Moon,J. ; Lee,S.
Pub. info.: Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California.  pp.856-862,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3998
2.

Conference Proceedings
Conference Proceedings
2. NA optimization of 360-nm and 300-nm pitch devices
Kim,H. ; Kim,S. ; Kim,C. ; Hong,J. ; Lee,J. ; Kang,H. ; Moon,J.
Pub. info.: Optical microlithography XI : 25-27 February 1998, Santa Clara, California.  pp.673-677,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3334