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10 results

Conference Proceedings

1. R-mask: a new concept and its application for small-volume production

Hayano, K. ; Hotta, S. ; Hasegawa, N. ; Hosono, K. ; Tanaka, T. ; Suko, K. ; Sasaki, S. ; Mohri, H. ; Hoga, M. ; Hayashi, N.

Pub. info.:	24th Annual BACUS Symposium on Photomask Technology. pp.257-268, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5567

Conference Proceedings

2. CD-measurement technique for hole patterns on stencil mask

Ishikawa, M. ; Yusa, S. ; Takikawa, T. ; Fujita, H. ; Sano, H. ; Hoga, M. ; Hayashi, N.

Pub. info.:	24th Annual BACUS Symposium on Photomask Technology. pp.1107-1116, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5567

Conference Proceedings

3. Feasibility study of manufacturing process and quality control for the new alternatingPSM structure (BACUS Best Poster)

Morikawa, Y. ; Kokubo, H. ; Nishiguchi, M. ; Nara, M. ; Totsu, Y. ; Hoga, M. ; Hayashi, N.

Pub. info.:	18th European Conference on Mask Technology for Integrated Circuits and Microcomponents. pp.224-234, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4764

Conference Proceedings

4. Defect printability analysis on alternating phase-shifting masks for 193-nm lithography

Morikawa, Y. ; Totsu, Y. ; Nishiguchi, M. ; Hoga, M. ; Hayashi, N. ; Pang, L. ; Luk-Pat, G.T.

Pub. info.:	22nd Annual BACUS Symposium on Photomask Technology. Part Two pp.922-934, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4889

Conference Proceedings

5. Optimization of Alt-PSM structure for 100-nm-node ArF lithography: ＩＩ

Mesuda, K. ; Toyama, N. ; Narukawa, S. ; Morikawa, Y. ; Mohri, H. ; Hayashi, N. ; Hoga, M.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology IX. pp.396-409, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4754

Conference Proceedings

6. Feasibility study of detectability and printability for TaSiO_x

Nishiguchi, M. ; Morikawa, Y. ; Motonaga, T. ; Noguchi, K. ; Sasaki, S. ; Mohri, S.H. ; Hoga, M. ; Hayashi, N.

Pub. info.:	22nd Annual BACUS Symposium on Photomask Technology. Part Two pp.955-963, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4889

Conference Proceedings

7. 200-mm EPL stencil mask fabrication and metrology at DNP: IP and CD accuracy within subfield

Takikawa, T. ; Ishikawa, M. ; Yusa, S. ; Kinase, Y. ; Fujita, H. ; Hoga, M. ; Hayashi, N. ; Sano, H.

Pub. info.:	Emerging Lithographic Technologies VIII. pp.727-739, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5374

Conference Proceedings

8. Development of a LEEPL mask: flatness and IP measurements

Aritsuka, Y. ; Kitada, M. ; Kurosawa, M. ; Takikawa, T. ; Fujita, H. ; Sano, H. ; Hoga, M. ; Hayashi, N.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XI. pp.941-949, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5446

Conference Proceedings

9. Evaluation of OASIS. VSB (SEMI P44) for practical use [6283-58]

Kuriyama, K. ; Suzuki, T. ; Narukawa, S. ; Mohri, H. ; Hoga, M. ; Hayashi, N.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XIII. pp.62832O-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6283

10.

Conference Proceedings

10. R-mask: simple and low-cost fabrication techniques

Fujii, A. ; Sasaki, S. ; Shimizu, M. ; Kobayashi, Y. ; Tominaga, T. ; Hoga, M. ; Mohri, H. ; Hayashi, N. ; Hayano, K. ; Hasegawa, N. ; Hosono, K. ; Arai, T.

Pub. info.:	24th Annual BACUS Symposium on Photomask Technology. pp.960-967, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5567

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