1.

Conference Proceedings

Conference Proceedings
Chabala,J.M. ; Abboud,F.E. ; Dean,R.L. ; Weaver,S. ; Cole,D.M. ; Sauer,C.A. ; F.Raymond ? ; Hofmann,U.
Pub. info.: Emerging lithographic technologies III : 15-17 March 1999, Santa Clara, California.  Part1  pp.80-99,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3676
2.

Conference Proceedings

Conference Proceedings
Abboud,F.E. ; Dean,R.L. ; Doering,J.J. ; Eckes,W. ; Gesley,M.A. ; Hofmann,U. ; Mulera,T. ; Naber,R.J. ; Pastor,M. ; Phillips,W. ; Raphael,J. ; Raymond,F.,?. ; Sauer,C.A.
Pub. info.: Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan.  pp.116-124,  1997.  Bellingham, Washington.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3096
3.

Conference Proceedings

Conference Proceedings
Chabala,J.M. ; Abboud,F.E. ; Sauer,C.A. ; Weaver,S. ; Lu,M. ; Pearce-Percy,H.T. ; Hofmann,U. ; Vernon,M. ; Ton,D. ; Cole,D.M. ; Naber,R.J.
Pub. info.: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part1  pp.36-48,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3873
4.

Conference Proceedings

Conference Proceedings
Chakarina,V. ; Sauer,C.A. ; Shamoun,B. ; Chiles,F. ; Trost,D. ; Zywno,M. ; Hofmann,U. ; Teizel,R. ; Prior,R. ; III,F.Raymond ; Ghanbari,A. ; Abboud,F.E.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VII.  pp.580-593,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4066