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Organic nonlinear optical materials and devices : symposium held April 6-9, 1999, San Francisco, California, U.S.A.. pp.131-, 1999. Warrendale, PA. MRS - Materials Research Society
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EMLC 2005 : 21st European Mask and Lithography Conference : 31 January-3 February, 2005, Dresden, Germany. pp.6-12, 2005. Bellingham, Wash.,. SPIE - The International Society of Optical Engineering
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Design and process integration for microelectronic manufacturing III : 3-4 March 2005, San Jose, California, USA. pp.120-130, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
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Photomask and Next-Generation Lithography Mask Technology XIII. pp.62831G-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
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22nd Annual BACUS Symposium on Photomask Technology. Part Two pp.1155-1162, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
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Photomask and Next-Generation Lithography Mask Technology XI. pp.481-498, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
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Photomask Technology 2006. pp.634922-634922, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
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