1.

Conference Proceedings
Conference Proceedings
1. High Density Plasma Processing of Microcrystalline Si Thin Films
Joshi, P.C. ; Voutsas, A.T. ; Hartzell, J.W.
Pub. info.: Amorphous and nanocrystalline silicon science and technology - 2005 : symposium held March 28-April 1, 2005, San Francisco, California, U.S.A..  pp.93-98,  2005.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 862
2.

Conference Proceedings
Conference Proceedings
2. High Density Plasma Growth of Thermal Quality SiO2 Thin Films
Joshi, P.C. ; Ono, Y. ; Voutsas, A.T. ; Hartzell, J.W.
Pub. info.: Silicon nitride, silicon dioxide thin insulating films, and other emerging dieletrics VIII : proceedings of the international symposium.  pp.124-135,  2005.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2005-01
3.

Conference Proceedings
Conference Proceedings
3. Low-temperature processing of SiO2 thin films by HD-PECVD technique for gate dielectric applications
Joshi, P.C. ; Moriguchi, M. ; Crowder, M.A. ; Droes, S.R.T. ; Flores, J.S. ; Voutsas, A.T. ; Hartzell, J.W.
Pub. info.: Poly-Silicon Thin Film Transistor Technology and Applications in Displays and Other Novel Technology Areas.  pp.105-112,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5004