1.

Conference Proceedings
Conference Proceedings
1. Advanced NLD mask dry etching system for 90-nm node technology
Harashima, N. ; Sasaki, T. ; Kuwahara, K. ; Hayashi, T. ; Tanaka, Y. ; Yoshioka, N. ; Hara, M. ; Ohkubo, Y.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.275-280,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
2.

Conference Proceedings
Conference Proceedings
2. Improvement of NLD mask dry etching system for 100-nm-node technology
Tanaka, Y. ; Yoshioka, N. ; Harashima, N. ; Sasaki, T. ; Kuwahara, K. ; Hayashi, T. ; Hara, M. ; Ohkubo, Y.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part One  pp.619-625,  2002.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
3.

Conference Proceedings
Conference Proceedings
3. Development of new chrome blanks for 65-nm node and beyond
Hashimoto, M. ; Yamada, T. ; Sakamoto, M. ; Hara, M. ; Ohkubo, Y. ; Ushida, M.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.974-982,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567