1.

Conference Proceedings
Conference Proceedings
1. Challenge for effective OCV control in 90-nm logic gate using ArF lithography
Kang, H.-J. ; Lee, S.-W. ; Lee, D.-Y. ; Yeo, G.-S. ; Lee, J.-H. ; Cho, H.-K. ; Han, W.-S. ; Moon, J.-T.
Pub. info.: Optical Microlithography XVI.  Part Two  pp.1194-1201,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
2.

Conference Proceedings
Conference Proceedings
2. Comprehensive approach to determining the specification for mask mean to target
Lee, S.-W. ; Kim, I.S. ; Lee, J.-H. ; Cho, H.-K. ; Han, W.-S.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part One  pp.209-220,  2002.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
3.

Conference Proceedings
Conference Proceedings
3. Assessments on process parameters' influences to the proximity correction
Lee, E.-M. ; Lee, S.-W. ; Lee, D.-Y. ; Choi, S.-H. ; Park, J.-O. ; Jung, S.-G. ; Yeo, G.-S. ; Lee, J.-H. ; Cho, H.-K. ; Han, W.-S.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.287-295,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5375
4.

Conference Proceedings
Conference Proceedings
4. Fulfillment of model-based OPC for contact patterns in 60-nm level logic device
Kim, S.-W. ; Lee, S.-W. ; Park, C.-M. ; Choi, S.-H. ; Lee, Y.-M. ; Kang, Y. ; Yeo, G.-S. ; Lee, J.-H. ; Cho, H.-K. ; Han, W.-S.
Pub. info.: Optical Microlithography XVII.  pp.1157-1164,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377