1.

Conference Proceedings
Conference Proceedings
1. Monitoring system of CD error analysis for the 90-nm node mask manufacturing [5853-11]
Yu, S.-Y. ; Kim, S.-H. ; Cha, B.-C. ; Kim, Y.-H. ; Choi, S.-W. ; Yoon, H.-S. ; Han, W.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.83-89,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
2.

Conference Proceedings
Conference Proceedings
2. Analysis of mask CD error by dose modulation for fogging effect
Lee, H. ; Yang, S.-H. ; Kim, B.-G. ; Moon, S.-Y. ; Choi, S.-W. ; Yoon, H.-S. ; Han, W.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.143-147,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
3.

Conference Proceedings
Conference Proceedings
3. Study of Cr patch validity for ArF CPL mask and its fabrication
Kim, C.-H. ; Kim, S.-H. ; Lee, M.-S. ; Park, J.-S. ; Shin, I.-G. ; Choi, S.-W. ; Yoon, H.-S. ; Han, W.-S.
Pub. info.: Optical Microlithography XVII.  pp.1247-1254,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377