1.

Conference Proceedings
Conference Proceedings
1. Implementing chemically amplified resist to 10kV raster e-beam process in photomask manufacturing [5853-19]
Kim, S.-K. ; Kim, B.-G. ; Moon, S.-Y. ; Choi, S.-W. ; Han, W.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.425-431,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
2.

Conference Proceedings
Conference Proceedings
2. Evaluations of optical performance for micro-trench on quartz etch in ArF lithography [5853-67]
Ahn, W.-S. ; Kwon, H.-J. ; Moon, S.-Y. ; Choi, S.-W. ; Han, W.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.818-826,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
3.

Conference Proceedings
Conference Proceedings
3. Automated CD SEM tilt-ready for primetime: a fast in-line methodology for differentiating lines vs. spaces
Choi, Y.-H. ; Sung, M.-K. ; Lee, S.-H. ; Lee, J.-H. ; Park, J.-H. ; Choi, I.-H. ; Moon, S.-Y. ; Choi, S.-W. ; Han, W.-S.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XIX.  pp.351-362,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5752
4.

Conference Proceedings
Conference Proceedings
4. Analysis of mask CD error by dose modulation for fogging effect
Lee, H. ; Yang, S.-H. ; Kim, B.-G. ; Moon, S.-Y. ; Choi, S.-W. ; Yoon, H.-S. ; Han, W.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.143-147,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446