1.

Conference Proceedings
Conference Proceedings
1. EUV mask pattern inspection for memory mask fabrication in 45-nm node and below [6349-95]
Kim, D. Y. ; Cho, S. Y. ; Kim, H. ; Huh, S. M. ; Chung, D. H. ; Cha, B. C. ; Lee, J. W. ; Choi, S. W. ; Han, W. S. ; Park, K. H. ; Kim, E. J. ; Guo, Z. ; Quach, E. ; Gee, D. ; Brown, T.
Pub. info.: Photomask Technology 2006.  pp.63492L-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349
2.

Conference Proceedings
Conference Proceedings
2. Feasibility study of mask fabrication in double exposure technology [6349-67]
Doh, J. G. ; Lee, S. H. ; Yoon, J. B. ; Lee, D. Y. ; Cho, S. Y. ; Kim, B. G. ; Choi, S. W. ; Han, W. S.
Pub. info.: Photomask Technology 2006.  pp.63491U-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349