1.

Conference Proceedings
Conference Proceedings
1. Ultra-low k1 oxide contact hole formation and metal filling using resist contact hole pattern by double L&S formation method
H. Nakamura ; M. Omura ; S. Yamashita ; Y. Taniguchi ; J. Abe ; S. Tanaka ; S. Inoue
Pub. info.: Optical microlithography XX.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6520
2.

Conference Proceedings
Conference Proceedings
2. Ion implantation as insoluble treatment for resist stacking process
H. Nakamura ; T. Shibata ; K. Rikimaru ; S. Ito ; S. Tanaka
Pub. info.: Advances in resist materials and processing technology XXV.  2  pp.692322-1-692322-12,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6923