1.

Conference Proceedings
Conference Proceedings
1. Post Salicidation Clean: Selective Removal of Un-Reacted NiPt Towards NiPtSi(Ge)
K. Xu ; A. Lauwers ; R. Vos ; L. Archer ; H. Kraus
Pub. info.: Cleaning and surface conditioning technology in semiconductor device manufacturing 10.  pp.327-334,  2007.  Pennington, N.J..  Electrochemical Society
Title of ser.: ECS transactions
Ser. no.: 11(2)
2.

Conference Proceedings
Conference Proceedings
2. SELECTIVE ETCHING OF SiGe FOR REMOVAL OF DUMMY LAYERS IN FULLY SILICIDED GATE ARCHITECTURES
J. Snow ; R. Vos ; K. G. Anil ; H. Kraus ; K. Xu ; F. Grinninger ; G. Wagner ; F. Kovacs ; P. W. Mertens
Pub. info.: Cleaning Technology in Semiconductor Device Manufacturing IX.  pp.207-213,  2006.  Pennington, NJ.  Electrochemical Society
Title of ser.: ECS transactions
Ser. no.: 1(3)