1.

Conference Proceedings
Conference Proceedings
1. Performance of immersion lithography for 45-nm-node CMOS and ultra-high density SRAM with 0.25um2
S. Mimotogi ; F. Uesawa ; M. Tominaga ; H. Fujise ; K. Sho ; M. Katsumata ; H. Hane ; A. Ikegami ; S. Nagahara ; T. Ema ; M. Asano ; H. Kanai ; T. Kimura ; M. Iwai
Pub. info.: Optical microlithography XX.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6520
2.

Conference Proceedings
Conference Proceedings
2. Impact of patterning strategy on mask fabrication beyond 32nm
S. Mimotogi ; T. Higaki ; H. Kanai ; S. Tanaka ; M. Satake
Pub. info.: Photomask and next-generation lithography mask technology XV.  1  pp.702814-1-702814-9,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 7028