1.

Conference Proceedings
Conference Proceedings
1. SUB-NANOMETER HIGH -K GATE STACK SCALING USING THE HF-LAST/NH3 AKNEAL INTERFACE
Peterson, J. ; Barnett, J. ; Young, C. ; Hou, A. ; Gutt, J. ; Gopalan, S. ; Lee, C.H. ; Li, H.J. ; Moumen, N. ; Chaudhary, N. ; Lee, B.H. ; Bersuker, G. ; Zietzoff, P. ; Brown, G.A. ; Lysaght, P. ; Gardner, M. ; Murto, R.W. ; Huff, H.
Pub. info.: Cleaning technology in semiconductor device manufacturing VIII : proceedings of the international symposium.  pp.93-99,  2003.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-26
2.

Conference Proceedings
Conference Proceedings
2. An Advanced High-k Transistor Utilizing Metal-Organic Precursors in an ALD Deposition of Hafnium Oxide and Hafnium Silicate With Ozone as Oxidizer
Gutt, J. ; Brown, G.A. ; Senzaki, Yoshi ; Park, Seung
Pub. info.: Integration of advanced micro- and nanoelectronic devices - critical issues and solutions : symposium held April 13-16, 2004, San Francisco, California, U.S.A..  pp.25-30,  2004.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 811
3.

Conference Proceedings
Conference Proceedings
3. Experimental Study of Etched Back Thermal Oxide for Optimization of the Si/High-k Interface
Barnett, Joel ; Moumen, N. ; Gutt, J. ; Gardner, M. ; Huffman, C. ; Majhi, P. ; Peterson, J.J. ; Gopalan, S. ; Foran, B. ; Li, H.-J. ; Lee, B.H. ; Bersuker, G. ; Zeitzoff, P.M. ; Brown, G.A. ; Lysaght, P. ; Young, C. ; Murto, R.W. ; Huff, H.R.
Pub. info.: Integration of advanced micro- and nanoelectronic devices - critical issues and solutions : symposium held April 13-16, 2004, San Francisco, California, U.S.A..  pp.841-846,  2004.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 811