1.

Conference Proceedings
Conference Proceedings
1. High-sensitivity nanocomposite resist materials for x-ray and EUV lithography
Ali, M.A. ; Gonsalves, K.E. ; Batina, N. ; Golovkina, V. ; Cerrina, F.
Pub. info.: Advances in Resist Technology and Processing XX.  2  pp.1173-1180,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039
2.

Conference Proceedings
Conference Proceedings
2. Nanocomposite resist for low-voltage electron beam lithography (LVEBL)
Ali, M.A. ; Gonsalves, K.E. ; Agrawal, A. ; Jeyakumar, A. ; Henderson, C.L.
Pub. info.: Advances in Resist Technology and Processing XX.  1  pp.442-452,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039