1.

Conference Proceedings
Conference Proceedings
1. Block and random copolymer resists designed for 193-nm lithography and environmentally friendly supercritical CO2 development
Gabor,A.H. ; Allen,R.D. ; Gallagher-Wetmore,P.M. ; Ober,C.K.
Pub. info.: Advances in resist technology and processing XIII : 11-13 March 1996, San Clara, California.  pp.410-417,  1996.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2724
2.

Conference Proceedings
Conference Proceedings
2. Supercritical fluid processing:opportunities for new resist materials and processes
Gallagher-Wetmore,P.M. ; Ober,C.K. ; Gabor,A.H. ; Allen,R.D.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography X.  pp.289-299,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2725