19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California. Part2 pp.979-986, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
Photomask and Next-Generation Lithography Mask Technology VIII. pp.147-154, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering