1.

Conference Proceedings
Conference Proceedings
1. Integrated SAC and Liner Etch for 0.15 um Node Technology
Fang, S. ; Dobuzinsky, D. ; Gutmann, A.
Pub. info.: Plasma etching processes for sub-quarter micron devices : proceedings of the international symposium.  pp.233-238,  1999.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 99-30
2.

Conference Proceedings
Conference Proceedings
2. A method of tn-situ Monitoring Oxide/Nitride Etch Selectivity
Fang, S. ; Gutmann, A. ; Flietner, B.
Pub. info.: Plasma processing XIII : proceedings of the international symposium.  pp.124-128,  2000.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2000-6