1.

Conference Proceedings
Conference Proceedings
1. Transient Enhanced Diffusion and Ostwald Ripening of Ion-Implantation Generated Defects in Silicon
Cowern, N.E.B. ; Mannino, G. ; Roozeboom, F. ; Stalk, P.A. ; Huizing, H.G.A. ; van Berkum, J.G.M ; Toan, N.N. ; Woerlee, P.H. ; Cristiano, F. ; Claverie, A.
Pub. info.: Advances in rapid thermal processing : proceedings of the symposium.  pp.125-132,  1999.  Pennington, N. J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 99-10
2.

Conference Proceedings
Conference Proceedings
2. Role of Silicon and Boron Interstitial Clusters in Transient Enhanced Diffusion
Cowern, N.E.B. ; Mannino, G. ; Roozeboom, F. ; van Berkum, J.G.M ; Colombeau, B. ; Claverie, A.
Pub. info.: Rapid thermal and other short-time processing technologies : proceedings of the international symposium.  pp.61-72,  2000.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2000-9
3.

Conference Proceedings
Conference Proceedings
3. Current Understanding and Modeling of B Diffusion and Activation Anomalies in Preamorphized Ultra-Shallow Junctions
Colombeau, B. ; Smith, A.J. ; Cowern, N.E.B. ; Pawlak, B.J. ; Cristiano, F. ; Duffy, R. ; Claverie, A. ; Ortiz, C.J. ; Pichler, P. ; Lampin, E. ; Zechner, C.
Pub. info.: Silicon front-end junction formation : physics and technology : symposium held April 13-15, 2004, San Francisco, California, U.S.A..  pp.91-102,  2004.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 810