Jackson, C.A. ; Buck, P.D. ; Cohen, S. ; Garg, V. ; Hickethier, J. ; Howard, C.H. ; Kiefer, R.M. ; Lamantia, M.J. ; Manfredo, J.C. ; Tsou, J.G.
Pub. info.:
Photomask and Next-Generation Lithography Mask Technology XI. pp.67-75, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering