1.

Conference Proceedings
Conference Proceedings
1. Transient Enhanced Diffusion and Ostwald Ripening of Ion-Implantation Generated Defects in Silicon
Cowern, N.E.B. ; Mannino, G. ; Roozeboom, F. ; Stalk, P.A. ; Huizing, H.G.A. ; van Berkum, J.G.M ; Toan, N.N. ; Woerlee, P.H. ; Cristiano, F. ; Claverie, A.
Pub. info.: Advances in rapid thermal processing : proceedings of the symposium.  pp.125-132,  1999.  Pennington, N. J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 99-10
2.

Conference Proceedings
Conference Proceedings
2. 9 Structure and thermal evolution of small clusters found after ultralow-energy high-dose boron implantation in Si
Hebras, X. ; Cristiano, F. ; Cherkash, N. ; Lerch, W. ; Paul, S. ; Pawlalr, B. ; Surdeano, R. ; Claverie, A.
Pub. info.: Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium.  pp.67-82,  2003.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-14
3.

Conference Proceedings
Conference Proceedings
3. 10 Relation between thermal evolution of interstitial defects and Transient Enhanced Diffusion in silicon
Claverie, A. ; Cristiano, F. ; Colombeau, B. ; Hebras, X. ; Calvo, P. ; Cherkoshin, N. ; Larnrani, Y. ; Scheid, E. ; de Mauduit, B. ; Lampin, E.
Pub. info.: Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium.  pp.73-82,  2003.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-14
4.

Conference Proceedings
Conference Proceedings
4. Ostwald Ripening of {113} Defects Precursors and Transient Enhanced Diffusion
Mannino, G. ; Cowern, N. E. B. ; Stolk, P. A. ; Roozeboom, F. ; Huizing, H. G. A. ; Berkum, J. G. M. van ; Boer, W. B. de ; Cristiano, F. ; Claverie, A. ; Jaraiz, M.
Pub. info.: Si front-end processing - physics and technology of dopant-defect interactions : symposium held April 6-9, 1999, San Francisco, California, U.S.A..  pp.163-,  1999.  Warrendale, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 568
5.

Conference Proceedings
Conference Proceedings
5. Annealing Behavior Of Locally Confined Dislocation Loops Under Inert And Oxidizing Ambient
Tsamis, C. ; Skarlatos, D. ; Raptis, I. ; Tsoukalas, D. ; Calvo, P. ; Colombeau, B. ; Cristiano, F. ; Claverie, A.
Pub. info.: Silicon front-end junction formation technologies : symposium held April 2-4, 2002, San Francisco, California, U.S.A..  pp.243-248,  2002.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 717
6.

Conference Proceedings
Conference Proceedings
6. Current Understanding and Modeling of B Diffusion and Activation Anomalies in Preamorphized Ultra-Shallow Junctions
Colombeau, B. ; Smith, A.J. ; Cowern, N.E.B. ; Pawlak, B.J. ; Cristiano, F. ; Duffy, R. ; Claverie, A. ; Ortiz, C.J. ; Pichler, P. ; Lampin, E. ; Zechner, C.
Pub. info.: Silicon front-end junction formation : physics and technology : symposium held April 13-15, 2004, San Francisco, California, U.S.A..  pp.91-102,  2004.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 810
7.

Conference Proceedings
Conference Proceedings
7. On the 'Life' of {113} Defects
Cherkashin, N. ; Calvo, P. ; Cristiano, F. ; Mauduit, B.de ; Claverie, A.
Pub. info.: Silicon front-end junction formation : physics and technology : symposium held April 13-15, 2004, San Francisco, California, U.S.A..  pp.103-108,  2004.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 810
8.

Conference Proceedings
Conference Proceedings
8. Atomistic Simulations of Extrinsic Defects Evolution and Transient Enhanced Diffusion in Silicon
Claverie, A. ; Colombeau, B. ; Cristiano, F. ; Altibelli, A. ; Bonafos, C.
Pub. info.: Si front-end processing -- physics and technology of dopant-defect interactions III : symposium held April 17-19, 2001, San Francisco, California, U.S.A..  2001.  Warrendale, PA.  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 669
9.

Conference Proceedings
Conference Proceedings
9. Physics-Based Diffusion Simulations for Preamorphized Ultra-Shallow Junctions
Cowern, N. E. B. ; Colombeau, B. ; Lampin, E. ; Cristiano, F. ; Claverie, A. ; Lamrani, Y. ; Duffy, R. ; Venezia, V. ; Heringa, A. ; Wang, C. C. ; Zechner, C.
Pub. info.: CMOS front-end materials and process technology : symposium held April 22-24, 2003, San Francisco, California, U.S.A..  pp.199-204,  2003.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 765
10.

Conference Proceedings
Conference Proceedings
10. Effect of the Ge Preamorphization Dose on the Thermal Evolution of End of Range Defects
Colombeau, B. ; Cristiano, F. ; Marrot, J.-C. ; Assayag, G. Ben ; Claverie, A.
Pub. info.: Si front-end processing -- physics and technology of dopant-defect interactions III : symposium held April 17-19, 2001, San Francisco, California, U.S.A..  2001.  Warrendale, PA.  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 669