1.

Conference Proceedings
Conference Proceedings
1. Phase defect printability analysis for chromeless phase lithography technology
Huh, S. ; Park, J.H. ; Chung, D.-H. ; Kim, C.-H. ; Shin, I.-K. ; Choi, S.-W. ; Sohn, J.-M.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.787-795,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
2.

Conference Proceedings
Conference Proceedings
2. New resolution enhancement technology for manufacturing sub-100-nm technology
Chung, D.-H. ; Park, J.-Y. ; Lee, M.-K. ; Shin, I.-K. ; Choi, S.-W. ; Yoon, H.-S. ; Sohn, J.-M. ; Chen, J.F. ; Van Den Broeke, D.J.
Pub. info.: Optical Microlithography XV.  Part Two  pp.1492-1499,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
3.

Conference Proceedings
Conference Proceedings
3. Development of mask-making process for CLM manufacturing technology
Park, J.-H. ; Chung, D.-H. ; Lee, M.-K. ; Shin, I.-K. ; Choi, S.-W. ; Yoon, H.-S. ; Sohn, J.-M. ; Chen, J.F. ; Van Den Broeke, D.J.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology IX.  pp.727-736,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4754