1.

Conference Proceedings
Conference Proceedings
1. Simulation and modeling of electron-beam lithography for delineating 0.2-ｦﾌm line and space patterns
Ham,Y.-M. ; Lee,C.-B. ; Suh,T.W. ; Chun,K. ; Lee,J.
Pub. info.: Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March 1996, Santa Clara, California.  pp.159-168,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2723
2.

Conference Proceedings
Conference Proceedings
2. Profile characteristics and simulation of chemically amplified resists in electron-beam lithography
Ham,Y.-M. ; Lee,C. ; Kim,S.-H. ; Chun,K.
Pub. info.: Microlithographic Techniques in IC Fabrication.  pp.154-160,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3183