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Conference Proceedings

1. Scaling considerations of interpoly oxide-nitride-oxide dielectric for high-density DRAM applications

Ma,Z. ; Choi,J.Y. ; Lien,C.-D.

Pub. info.:	Microelectronic Device and Multilevel Interconnection Technology II. pp.201-206, 1996. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2875

Conference Proceedings

2. CMOS LDD process with seven masking steps from well to passivation

Choi,J.Y. ; Chien,C.-J. ; Han,C.-C. ; Lien,C.-D.

Pub. info.:	Microelectronic Device and Multilevel Interconnection Technology. pp.110-114, 1995. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2636

Conference Proceedings

3. Integrity of N2O oxides in WSi2 polycide process

Chien,C.J. ; Choi,J.Y. ; Lo,G. ; Lien,C.-D.

Pub. info.:	Microelectronic Device and Multilevel Interconnection Technology. pp.165-169, 1995. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2636