1.

Conference Proceedings
Conference Proceedings
1. Challenge to 0.13-ｦﾌm device patterning using KrF
Kim,I.-S. ; Lee,J.-H. ; Cha,D.-H. ; Park,J.-S. ; Cho,H.-K. ; Moon,J.-T.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part2  pp.872-881,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
2.

Conference Proceedings
Conference Proceedings
2. Evaluation of phase-edge phase-shifting mask for sub-0.18-ｦﾌm gate patterns in logic devices
Cha,D.-H. ; Kye,J.-W. ; Seong,N.-G. ; Kang,H.-Y. ; Cho,H.-K. ; Moon,J.-T.
Pub. info.: Optical microlithography XI : 25-27 February 1998, Santa Clara, California.  pp.46-54,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3334