Search records | 東京工業大学附属図書館文献データベース

Sort order

3 results

Conference Proceedings

1. Measurement of lens aberration by using in-situ interferometer and classification of lens for correct application

Seong,N. ; Yeo,G. ; Cho,H. ; Moon,J.

Pub. info.:	Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part1 pp.30-39, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4000

Conference Proceedings

2. Patterning 220-nm pitch DRAM patterns by using double mask exposure

Nam,D. ; Seong,N. ; Cho,H. ; Moon,J. ; Lee,S.

Pub. info.:	Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part1 pp.283-292, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4000

Conference Proceedings

3. Optimal lens assignment through measured aberrations

Seong,N. ; Kang,Y.S. ; Cho,H. ; Moon,J.

Pub. info.:	Optical Microlithography XIV. 4346 pp.1-7, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4346