1.

Conference Proceedings
Conference Proceedings
1. Measurement of lens aberration by using in-situ interferometer and classification of lens for correct application
Seong,N. ; Yeo,G. ; Cho,H. ; Moon,J.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part1  pp.30-39,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
2.

Conference Proceedings
Conference Proceedings
2. Interfield sampling method dependency of overlay and global alignment
Hong,J. ; Lee,J. ; Cho,H. ; Moon,J. ; Lee,S.
Pub. info.: Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California.  pp.856-862,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3998
3.

Conference Proceedings
Conference Proceedings
3. Patterning 220-nm pitch DRAM patterns by using double mask exposure
Nam,D. ; Seong,N. ; Cho,H. ; Moon,J. ; Lee,S.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part1  pp.283-292,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
4.

Conference Proceedings
Conference Proceedings
4. Application of phase-edge PSM for narrow logic gate
Kim,B. ; Park,C. ; Ryoo,M. ; Lee,K. ; Cho,H. ; Moon,J.
Pub. info.: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part2  pp.943-952,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3873
5.

Conference Proceedings
Conference Proceedings
5. Fabrication of membrane mask for next-generation lithography
Kim,D. ; Lera,J.D. ; Cho,H. ; Moon,J.
Pub. info.: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part1  pp.255-260,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3873
6.

Conference Proceedings
Conference Proceedings
6. Pattern asymmetry correction using assist patterns
Ryoo,M. ; Nam,D. ; Cho,H. ; Moon,J. ; Lee,S.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part1  pp.307-314,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
7.

Conference Proceedings
Conference Proceedings
7. Emergence of assist feature OPC era in sub-130-nm DRAM devices
Kim,B. ; Kim,I. ; Yeo,G. ; Lee,J. ; Choi,J. ; Cho,H. ; Moon,J.
Pub. info.: 20th Annual BACUS Symposium on Photomask Technology.  pp.452-459,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4186
8.

Conference Proceedings
Conference Proceedings
8. Optimal lens assignment through measured aberrations
Seong,N. ; Kang,Y.S. ; Cho,H. ; Moon,J.
Pub. info.: Optical Microlithography XIV.  4346  pp.1-7,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346