1.

Conference Proceedings
Conference Proceedings
1. Interfield sampling method dependency of overlay and global alignment
Hong,J. ; Lee,J. ; Cho,H. ; Moon,J. ; Lee,S.
Pub. info.: Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California.  pp.856-862,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3998
2.

Conference Proceedings
Conference Proceedings
2. Patterning 220-nm pitch DRAM patterns by using double mask exposure
Nam,D. ; Seong,N. ; Cho,H. ; Moon,J. ; Lee,S.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part1  pp.283-292,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
3.

Conference Proceedings
Conference Proceedings
3. Pattern asymmetry correction using assist patterns
Ryoo,M. ; Nam,D. ; Cho,H. ; Moon,J. ; Lee,S.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part1  pp.307-314,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000