1.

Conference Proceedings
Conference Proceedings
1. Interfield sampling method dependency of overlay and global alignment
Hong,J. ; Lee,J. ; Cho,H. ; Moon,J. ; Lee,S.
Pub. info.: Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California.  pp.856-862,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3998
2.

Conference Proceedings
Conference Proceedings
2. Emergence of assist feature OPC era in sub-130-nm DRAM devices
Kim,B. ; Kim,I. ; Yeo,G. ; Lee,J. ; Choi,J. ; Cho,H. ; Moon,J.
Pub. info.: 20th Annual BACUS Symposium on Photomask Technology.  pp.452-459,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4186
3.

Conference Proceedings
Conference Proceedings
3. Lithography process design for 4-Gb DRAM of 0.31 k1 with KrF
Park,J. ; Yeo,G. ; Kim,I. ; Kim,B.-S. ; Lee,J. ; Cho,H. ; Moon,J.T.
Pub. info.: Optical Microlithography XIV.  4346  pp.205-213,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
4.

Conference Proceedings
Conference Proceedings
4. Carbon antireflective coating (ARC) technology for both KrF and ArF lithography
Kim,Y. ; Lee,J. ; Cho,H. ; Moon,J.T.
Pub. info.: Optical Microlithography XIV.  4346  pp.994-1002,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346