1.

Conference Proceedings
Conference Proceedings
1. Characterization, modeling, and impact of scattered light in low-k1 lithography
Park, E.-S. ; Cho, H.-J. ; Kim, J, -M. ; Choi, S.-S.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.285-293,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
2.

Conference Proceedings
Conference Proceedings
2. A new method for correcting proximity and fogging effects by using the EID model of variable shaped beam for 65-nm node [5853-07]
Park, E.-S. ; Cho, H.-J. ; Kim, J.-M. ; Choi, S.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.58-65,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853