1.

Conference Proceedings
Conference Proceedings
1. 65 nm node photomask etching with zero CD process bias [5992-26]
Wu, B ; Chen, J. ; Markovitz, E. ; Xiao, G. ; Tam, S. ; Kumar, A. ; Ibrahim, I. ; Yau, W. -F.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.59920P-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
2.

Conference Proceedings
Conference Proceedings
2. Photomask etch challenges for futute technology nodes [6283-132]
Chandrachood, M. ; Grimbergen, M. ; Leung, B. Y. T. ; Koch, R. Yu. K. ; Chen, J. ; Ibrahim, M. I. ; Panayil, S. ; Kumar, A.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XIII.  pp.62830C-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6283