1.

Conference Proceedings
Conference Proceedings
1. ELECTRICAL AND MISCROSTRUCTURAL CHARACTERISTICS OF Ti CONTACTS ON (001) Si
Liauh, H. R. ; Chen, M. C. ; Chen, J. F. ; Chen, L. J.
Pub. info.: Advanced metallization and processing for semiconductor devices and circuits--II : symposium held April 27-May 1, 1992, San Francisco, California, U.S.A..  pp.635-640,  1992.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 260
2.

Conference Proceedings
Conference Proceedings
2. I-VM C-V AND HALL EFFECT STUDIES OF INDIUM-DOPED LPE GaAs
Chen, J. F. ; Xie, K. ; Wie, C. R.
Pub. info.: Advances in materials, processing, and devices in III-V compound semiconductors.  pp.209-214,  1989.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 144
3.

Conference Proceedings
Conference Proceedings
3. ROCKING-CURVE PEAK SHIFT IN THIN HETEROJUCTION SINGLE LAYERS
Wie, C. R. ; Choi, Y. W. ; Kim,. H. M ; Chen, J. F. ; Vreeland Jr., T. ; Tsai, C.-J
Pub. info.: III-V heterostructures for electronic/photonic devices : symposium held April 24-27, 1989, San Diego, California, U.S.A..  pp.487-492,  1989.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 145
4.

Conference Proceedings
Conference Proceedings
4. X-RAY PHOTOLUMINESCENCE AND ETCHING STUDIES OF INDIUM-DPIED LPE GaAs LAYERS
Chen, J. F. ; Wie. C. R ; Junga, F. A.
Pub. info.: Advances in materials, processing, and devices in III-V compound semiconductors.  pp.9-14,  1989.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 144
5.

Conference Proceedings
Conference Proceedings
5. SILICIDE FORMATION BY RAPID THERMAL PROCESSING
Chen, L. J. ; Lur, W. ; Chen, J. F. ; Lee, T. L. ; Liang, J. M.
Pub. info.: Rapid thermal and integrated processing III : symposium held April 4-7, 1994, San Francisco, California, U.S.A..  pp.99-,  1994.  Pittsburgh, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 342
6.

Conference Proceedings
Conference Proceedings
6. SOLID STATE AMORPHIZATION IN SILICIDE-FORMING SYSTEMS
Chen, L. J. ; Hsieh, W. Y. ; Lin, J. H. ; Lee, T. L. ; Chen, J. F. ; Liang, J. M. ; Wang, M. H.
Pub. info.: Silicides, germanides, and their interfaces : Symposium held November 29-December 2, 1993, Boston, Massachusetts, U.S.A..  pp.343-,  1994.  Pittsburgh, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 320
7.

Conference Proceedings
Conference Proceedings
7. Model-based scattering bars implementation for 65nm and 45nm nodes using IML technology [5853-50]
Hsu, M. ; Van Den Broeke, D. ; Laidig, T. ; Wampler, K. E. ; Hollerbach, U. ; Socha, R. ; Chen, J. F. ; Hsu, S. ; Shi, X.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.659-671,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
8.

Conference Proceedings
Conference Proceedings
8. Double exposure technique for 45nm node and beyond [5992-63]
Hsu, S. ; Park, J. ; Van Den Broeke, D. ; Chen, J. F.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.59921Q-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
9.

Conference Proceedings
Conference Proceedings
9. Halftone biasing OPC technology: an approach for achieving fine bias control on raster-scan systems
Nakagawa, K. H. ; Chen, J. F. ; Socha, R. J. ; Laidig, T. L. ; Wampler, K. E. ; Van Den Broeke, D. ; Dusa, M. V. ; Caldwell, R. F.
Pub. info.: Photomask and X-Ray Mask Technology VI.  pp.315-323,  1999.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3748
10.

Conference Proceedings
Conference Proceedings
10. Implementation of random contact hole design with CPL mask by using IML technology [5992-108]
Hsu, M. ; Van Den Broeke, D. ; Hsu, S. ; Chen, J. F. ; Shi, X. ; Corcoran, N. ; Yu, L.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.599237-599237,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
11.

Conference Proceedings
Conference Proceedings
11. Full-chip manufacturing reliability check and correction (MRC2): a first step toward design for manufacturability with low k1 lithography
Hsu, M. ; Laidig, T. ; Wampler, K. E. ; Hsu, S. ; Shi, X. ; Chen, J. F. ; Van Den Broeke, D.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.382-393,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567
12.

Conference Proceedings
Conference Proceedings
12. Resist model calibration using 2D developed patterns for low-k1 process optimization and wafer printing predictions
Chen, T. ; Van Den Broeke, D. ; Park, S. ; Liebchen, A. ; Chen, J. F. ; Hsu, S. ; Park, J. C. ; Yu, L. ; Gronlund, K.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.434-444,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567
13.

Conference Proceedings
Conference Proceedings
13. High-resolution actinic imaging and phase metrology of 193-nm CPL reticles
Merriam, A. J. ; Jacob, J. J. ; Van Den Broeke, D. ; Hsu, S. ; Chen, J. F. ; Kasprowicz, B.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.894-904,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567
14.

Conference Proceedings
Conference Proceedings
14. Application challenges with double patterning technology (DPT) beyond 45 nm [6349-75]
Park, J. ; Hsu, S. ; Van Den Broeke, D. ; Chen, J. F. ; Dusa, M. ; Socha, R. ; Finders, J. ; Vleeming, B. ; van Oosten, A. ; Nikolsky, P. ; Wiaux, V. ; Hendrickx, E. ; Bekaert, J. ; Vandenberghe, G.
Pub. info.: Photomask Technology 2006.  pp.634922-634922,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349
15.

Conference Proceedings
Conference Proceedings
15. RET masks for the final frontier of optical lithography [5853-104]
Chen, J. F. ; Broeke, D. van den ; Hsu, S. ; Hsu, M. C.W. ; Laidig, T. ; Shi, X. ; Chen, T. ; Socha, R. J. ; Hollerbach, U. ; Wampler, K. E. ; Park, J. ; Park, S. ; Gronlund, K.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.168-179,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
16.

Conference Proceedings
Conference Proceedings
16. Feasibility study of double exposure lithography for 65nm and 45nm node [5853-114]
Hsu, S. ; Van Den Broeke, D. ; Chen, J. F. ; Park, J. ; Hsu, M. C. W.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.252-264,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
17.

Conference Proceedings
Conference Proceedings
17. Double dipole lithography for 65-nm node and beyond: defect sensitivity characterization and reticle inspection
Hsu, S. ; Chu, T. -B. ; Van Den Broeke, D. ; Chen, J. F. ; Hsu, M. ; Corcoran, N. P. ; Volk, W. ; Ruch, W. E. ; Sier, J. -P. ; Hess, C. E. ; Lin, B. ; Yu, C. C. ; Huang, G.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.711-722,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567
18.

Conference Proceedings
Conference Proceedings
18. Contact and via hole mask design optimization for 65-nm technology node
Van Den Broeke, D. ; Shi, X. ; Socha, R. ; Laidig, T. ; Hollerbach, U. ; Wampler, K. E. ; Hsu, S. ; Chen, J. F. ; Corcoran, N. P. ; Dusa, M. V. ; Park, J. C.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.680-690,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567
19.

Conference Proceedings
Conference Proceedings
19. OPC model calibration for CPL patterning at extreme low k1
Shi, X. ; Laidig, T. ; Chen, J. F. ; Van Den Broeke, D. ; Hsu, S. ; Hsu, M. ; Wampler, K. E. ; Hollerbach, U. ; Park, J. C. ; Yu, L.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.614-625,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567