1.

Conference Proceedings
Conference Proceedings
1. Model-based scattering bars implementation for 65nm and 45nm nodes using IML technology [5853-50]
Hsu, M. ; Van Den Broeke, D. ; Laidig, T. ; Wampler, K. E. ; Hollerbach, U. ; Socha, R. ; Chen, J. F. ; Hsu, S. ; Shi, X.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.659-671,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
2.

Conference Proceedings
Conference Proceedings
2. Double exposure technique for 45nm node and beyond [5992-63]
Hsu, S. ; Park, J. ; Van Den Broeke, D. ; Chen, J. F.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.59921Q-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
3.

Conference Proceedings
Conference Proceedings
3. Halftone biasing OPC technology: an approach for achieving fine bias control on raster-scan systems
Nakagawa, K. H. ; Chen, J. F. ; Socha, R. J. ; Laidig, T. L. ; Wampler, K. E. ; Van Den Broeke, D. ; Dusa, M. V. ; Caldwell, R. F.
Pub. info.: Photomask and X-Ray Mask Technology VI.  pp.315-323,  1999.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3748
4.

Conference Proceedings
Conference Proceedings
4. Implementation of random contact hole design with CPL mask by using IML technology [5992-108]
Hsu, M. ; Van Den Broeke, D. ; Hsu, S. ; Chen, J. F. ; Shi, X. ; Corcoran, N. ; Yu, L.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.599237-599237,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
5.

Conference Proceedings
Conference Proceedings
5. Full-chip manufacturing reliability check and correction (MRC2): a first step toward design for manufacturability with low k1 lithography
Hsu, M. ; Laidig, T. ; Wampler, K. E. ; Hsu, S. ; Shi, X. ; Chen, J. F. ; Van Den Broeke, D.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.382-393,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567
6.

Conference Proceedings
Conference Proceedings
6. Resist model calibration using 2D developed patterns for low-k1 process optimization and wafer printing predictions
Chen, T. ; Van Den Broeke, D. ; Park, S. ; Liebchen, A. ; Chen, J. F. ; Hsu, S. ; Park, J. C. ; Yu, L. ; Gronlund, K.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.434-444,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567
7.

Conference Proceedings
Conference Proceedings
7. High-resolution actinic imaging and phase metrology of 193-nm CPL reticles
Merriam, A. J. ; Jacob, J. J. ; Van Den Broeke, D. ; Hsu, S. ; Chen, J. F. ; Kasprowicz, B.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.894-904,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567
8.

Conference Proceedings
Conference Proceedings
8. Application challenges with double patterning technology (DPT) beyond 45 nm [6349-75]
Park, J. ; Hsu, S. ; Van Den Broeke, D. ; Chen, J. F. ; Dusa, M. ; Socha, R. ; Finders, J. ; Vleeming, B. ; van Oosten, A. ; Nikolsky, P. ; Wiaux, V. ; Hendrickx, E. ; Bekaert, J. ; Vandenberghe, G.
Pub. info.: Photomask Technology 2006.  pp.634922-634922,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349
9.

Conference Proceedings
Conference Proceedings
9. Feasibility study of double exposure lithography for 65nm and 45nm node [5853-114]
Hsu, S. ; Van Den Broeke, D. ; Chen, J. F. ; Park, J. ; Hsu, M. C. W.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.252-264,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
10.

Conference Proceedings
Conference Proceedings
10. Double dipole lithography for 65-nm node and beyond: defect sensitivity characterization and reticle inspection
Hsu, S. ; Chu, T. -B. ; Van Den Broeke, D. ; Chen, J. F. ; Hsu, M. ; Corcoran, N. P. ; Volk, W. ; Ruch, W. E. ; Sier, J. -P. ; Hess, C. E. ; Lin, B. ; Yu, C. C. ; Huang, G.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.711-722,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567