1.

Conference Proceedings
Conference Proceedings
1. Model-based scattering bars implementation for 65nm and 45nm nodes using IML technology [5853-50]
Hsu, M. ; Van Den Broeke, D. ; Laidig, T. ; Wampler, K. E. ; Hollerbach, U. ; Socha, R. ; Chen, J. F. ; Hsu, S. ; Shi, X.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.659-671,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
2.

Conference Proceedings
Conference Proceedings
2. Implementation of random contact hole design with CPL mask by using IML technology [5992-108]
Hsu, M. ; Van Den Broeke, D. ; Hsu, S. ; Chen, J. F. ; Shi, X. ; Corcoran, N. ; Yu, L.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.599237-599237,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
3.

Conference Proceedings
Conference Proceedings
3. Full-chip manufacturing reliability check and correction (MRC2): a first step toward design for manufacturability with low k1 lithography
Hsu, M. ; Laidig, T. ; Wampler, K. E. ; Hsu, S. ; Shi, X. ; Chen, J. F. ; Van Den Broeke, D.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.382-393,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567
4.

Conference Proceedings
Conference Proceedings
4. Double dipole lithography for 65-nm node and beyond: defect sensitivity characterization and reticle inspection
Hsu, S. ; Chu, T. -B. ; Van Den Broeke, D. ; Chen, J. F. ; Hsu, M. ; Corcoran, N. P. ; Volk, W. ; Ruch, W. E. ; Sier, J. -P. ; Hess, C. E. ; Lin, B. ; Yu, C. C. ; Huang, G.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.711-722,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567
5.

Conference Proceedings
Conference Proceedings
5. OPC model calibration for CPL patterning at extreme low k1
Shi, X. ; Laidig, T. ; Chen, J. F. ; Van Den Broeke, D. ; Hsu, S. ; Hsu, M. ; Wampler, K. E. ; Hollerbach, U. ; Park, J. C. ; Yu, L.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.614-625,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567