Chang, Y. Y. ; Wu, Y.-H. ; Shih, C.-L. ; Lin, J. ; Kan, F. ; Lin, J.
Pub. info.:
Photomask and Next-Generation Lithography Mask Technology XII. pp.757-766, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering