1.

Conference Proceedings
Conference Proceedings
1. Characterization of Silicon Surfaces After Low-Temperature H2 Annealing Prior to Low-Temperature Atmospheric Pressure Epitaxial Silicon Growth
Bender, Hugo ; Mouche, Marie-Jose ; Caymax, Matty
Pub. info.: Structure and evolution of surfaces : symposium held December 2-5, 1996, Boston, Massachusette, U.S.A..  pp.51-,  1997.  Pittsburgh, Pa..  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 440
2.

Conference Proceedings
Conference Proceedings
2. Comparative Growth Kinetics of SiGe in a Commercial Reduced Pressure Chemical Vapor Deposition EPI Reactor and Anomalies During Growth of Thin Si Layers on SiGe
Caymax, Matty ; Loo, Roger ; Brijs, Bert ; Vandervorst, Wilfried ; Howard, David J. ; Kimura, Kenji ; Nakajima, Kaoru
Pub. info.: Epitaxy and applications of si-based heterostructures : symposium held April 13-17, 1998, San Francisco, California, U.S.A..  pp.339-,  1998.  Warrendale, Pa..  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 533
3.

Conference Proceedings
Conference Proceedings
3. Ge Island Evolution During Growth, In Situ Anneal, and Si Capping in an Industrial CVD Reactor
Loo, Roger ; Meunier-Beillard, Philippe ; Dentel, Didier ; Goryll, Michael ; Vanhaeren, Danielle ; Vescan, Lili ; Bender, Hugo ; Caymax, Matty ; Vandervorst, Wilfried
Pub. info.: Amorphous and heterogeneous silicon-based films - 2001 : symposium held April 16-20, 2001, San Francisco, California, U.S.A..  2001.  Warrendale.  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 664
4.

Conference Proceedings
Conference Proceedings
4. High-k Materials for Advanced Gate Stack Dielectrics: A Comparison of ALCVD and MOCVD as Deposition Technologies
Caymax, Matty ; Bender, H. ; Brijs, B. ; Conard, T. ; Gendt, S. De ; Delabie, A. ; Heyns, M. ; Onsia, B. ; Ragnarsson, L. ; Richard, O. ; Vandervorst, W. ; Elshocht, S. Van ; Zhao, C. ; Maes, J. W. ; Date, L. ; Pique, D. ; Young, E. ; Tsai, W. ; Shimamoto, Y.
Pub. info.: CMOS front-end materials and process technology : symposium held April 22-24, 2003, San Francisco, California, U.S.A..  pp.47-58,  2003.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 765